Advantest to Install F7000 E-Beam Lithography System to Support imec’s Advanced Semiconductor R&D
Advantest Corporation (TSE: 6857, NYSE: ATE) May 19, 2015 – Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge F7000 electron-beam lithography system for installation at their research center in Leuven, Belgium. Imec is a world-renowned center for advanced research in microelectronics which was founded in 1984. The F7000 will be utilized at the nanoelectronics research center to conduct research and development into future leading-edge semiconductor-related technologies.
The F7000 offers the superior resolution performance and accuracy needed to expose structures in the 1xnm range, and enables research and development activities well in advance of current production nodes. With its unique character projection capabilities, the F7000 provides the flexibility to expose complex patterns at fast writing speeds.
“We are excited to be partnering with imec, the world’s foremost microelectronics research center, and to be working together to advance the science of semiconductor manufacturing,” said Josef Schraetzenstaller, managing director and CEO of Advantest Europe.
The installation at imec’s site in Leuven, Belgium will be Advantest’s first F7000 e-beam lithography installation in Europe. Advantest’s leadership in semiconductor test is well known, and this partnership will put a spotlight on the company’s nanotechnology division, which has produced leading-edge e-beam lithography and metrology solutions for decades.
Click here to learn more about imec: http://www.imec.be/
A world-class technology company, Advantest is the leading producer of automatic test equipment (ATE) for the semiconductor industry and a premier manufacturer of measuring instruments used in the design and production of electronic instruments and systems. Its leading-edge systems and products are integrated into the most advanced semiconductor production lines in the world. The company also focuses on R&D for emerging markets that benefit from advancements in nanotech and terahertz technologies, and has introduced multi-vision metrology scanning electron microscopes essential to photomask manufacturing, as well as groundbreaking 3D imaging and analysis tools. Founded in Tokyo in 1954, Advantest established its first subsidiary in 1982, in the USA, and now has subsidiaries worldwide. More information is available at www.advantest.com.
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